Author:
Indjin Milos,Griffiths Jack
Abstract
AbstractIn this work, we have modelled and computed the transport properties of the double-barrier InGaAs/GaAsSb structure from the resonant tunnelling point of view. Based on the classical Tsu-Esaki formula for the tunnelling current, we have calculated the current density-voltage characteristic of a Al-free type-II $$\hbox {In}_{0.53}\hbox {Ga}_{0.47}\hbox {As/GaAs}_{0.51}\hbox {Sb}_{0.49}$$In0.53Ga0.47As/GaAs0.51Sb0.49 structure at different cryogenic and elevated temperatures. The tunnelling coefficient has been calculated in the framework of effective mass approximation with nonparabolicity included, using the transfer matrix approach. A good qualitative agreement of the position of resonant current peaks with the existing experimental data was achieved. Our calculation shows a very high sensitivity of the tunnelling current peak on monolayer-scale layer structure fluctuation which strongly affects peak to valley ratio in the resonant tunnelling structure.
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
6 articles.
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