Author:
Sharlandjiev P. S.,Nazarova D. I.
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference20 articles.
1. Atanassova, E., Dimitrova, T.: Thin Ta2O5 layers as alternative to SiO2 for high density DRAM applications. In: Nalwa, H.S. (ed.) Handbook of Surfaces and Interfaces of Materials, vol. 4, pp. 439–479. Academic Press, San Diego (2001)
2. Atanassova E., Paskaleva A.: The effect of the metal electrode on the electrical characteristics of Ta2O5 capacitors for DRAM applications. In: Duenas, S., Castan, H. (eds) New Materials and Processes for Incoming Semiconductor Technologies., pp. 77–111. Transworld Research Network, Kerala (2006)
3. Atanassova E., Kalitzova M., Zollo G., Paskaleva A., Peeva A., Georgieva M., Vitali G.: High temperature-induced crystallization in Ta2O5 layers and its influence on the electrical properties. Thin Solid Films 426, 191–199 (2003)
4. Atanassova E., Konakova R., Mitin V., Koprinarova J., Litvin O., Okhrimenko O., Schinkarenko V., Virovska D.: Effect of microwave radiation on the properties of Ta2O5-Si microstructures. Microelect. Reliab. 45, 123–135 (2005)
5. Blanckenhagen B., Tonova D., Ullmann J.: Application of the Tauc–Lorentz formulation to the interband absorption of optical coating materials. Appl. Opt. 41, 3137–3141 (2002)
Cited by
5 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献