Relationship between texture and electromigration lifetime in sputtered AI-1% Si thin films-Reference-Cited by-同舟云学术

Relationship between texture and electromigration lifetime in sputtered AI-1% Si thin films

Published:1993-06 Issue:6 Volume:22 Page:589-596
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:JEM

Author:

Campbell Ann N.,Mikawa Russell E.,Knorr David B.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/BF02666403.pdf

Reference21 articles.

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3. S. Vaidya and A.K. Sinha,Thin Solid Films 75, 253 (1981).

4. M.J. Attardo and R. Rosenberg,J. Appl. Phys. 41,2381 (1970).

5. J. Cho and C.V. Thompson,App. Phys. Lett. 54, 2577 (1989).

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