Production of N, H, and NH active species in N2-H2 dc flowing discharges-Reference-Cited by-同舟云学术

Production of N, H, and NH active species in N2-H2 dc flowing discharges

Published:1995-12 Issue:4 Volume:15 Page:721-731
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Amorim J.,Baravia G.,Ricard A.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF01447069.pdf

Reference17 articles.

1. A. Ricard, J. Oseguera, H. Michel, and M. Gantois,Plasma Surface Engineering 1, 83 Inf. Verlag (1989).

2. J. P. Lebrun, H. Michel, and M. Gantois,Mem. Sci. Rev. Metall. 69, 727 (1972).

3. A. Ricard, J. Oseguera, L. Falk, H. Michel, and M. Gantois,IEEE Trans. Plasma Sci. 18, 940 (1990).

4. G. Cernogora, Thesis, Orsay, 1981.

5. J. Amorim, J. Loureiro, M. Touzeau, and G. Baravian,Proceedings of the 11th International Symposium on Plasma Chemistry, Loughborough, UK, 1511 (1993).

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