Author:
Ivchenko Dmitrii,Mariaux Gilles,Vardelle Armelle,Goutier Simon,Itina Tatiana E.,André Pascal
Publisher
Springer Science and Business Media LLC
Subject
Materials Chemistry,Surfaces, Coatings and Films,Condensed Matter Physics
Reference42 articles.
1. M.F. Smith, A.C. Hall, J.D. Fleetwood, and P. Meyer, Very Low Pressure Plasma Spray—A Review of an Emerging Technology in the Thermal Spray Community, Coatings, 2011, 1(2), p 117-132
2. E. Muehlberger, Method of forming uniform thin coatings on large substrates, US, US5853815A, 1998
3. G. Mauer, A. Hospach, and R. Vaßen, Process Development and Coating Characteristics of Plasma Spray-PVD, Surf. Coat. Technol., 2013, 220, p 219-224
4. K. von Niessen, M. Gindrat, and A. Refke, Vapor Phase Deposition Using Plasma Spray-PVDTM, J. Therm. Spray Technol., 2009, 19(1–2), p 502-509
5. K. von Niessen and M. Gindrat, Plasma Spray-PVD: A New Thermal Spray Process to Deposit Out of the Vapor Phase, J. Therm. Spray Technol., 2011, 20(4), p 736-743
Cited by
5 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献