Deposition of High Purity Parylene- F Using Low Pressure Low Temperature Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Deposition of High Purity Parylene- F Using Low Pressure Low Temperature Chemical Vapor Deposition

Published:1997-08 Issue:8 Volume:26 Page:949-953
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:Journal of Elec Materi

Author:

Wu P. K.,Yang G. -R.,You L.,Mathur D.,Cocoziello A.,Lang C. -I.,Moore J. A.,Lu T. -M.,Bakru H.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s11664-997-0280-8.pdf

Reference18 articles.

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2. P. Singer, Semiconductor International 11, 50, October, (1993).

3. J.G. McDonald, J.T. Lin, H.J. Greub, R.A. Philhower and S. Dabral, IEEE Trans. Comp. Hybrids. Manuf. Technol. 12, 195 (1989).

4. W.F. Beach, C. Lee, D.R. Bassett, T.M. Austin and R. Olson, Xylylene Polymers in Encyclopedia of Polymer Science and Engineering, 2nd Ed. 17, (New York: J. Wiley & Sons, 1991), p. 990.

5. N. Majid, S. Dabral, H.T. Lin, S. Balakrishnan and J.F. McDonald, Proc. IEEE VMIC-1988, p. 299.

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