Modeling of curvature in multilayered epitaxially grown films
Author:
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Link
http://link.springer.com/content/pdf/10.1007/s10999-007-9029-z.pdf
Reference25 articles.
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3. du Tre’molet de Lacheisserie, E., Peuzin, J.C.: Magnetostriction and internal-stresses in thin-films – the cantilever method revisited. J. Magnetism Magnetic Mater. 136(1–2), 189–196 (1994)
4. Elmasry, N.A., Hussien, S.A., Fahmy, A.A., Karam, N.H., Bedair, S.M.: Criterion for suppressing wafer bow in heterostructures by selective epitaxy. Mater. Lett. 14(1), 58–62 (1992)
5. Fitzgerald, E.A., Xie, Y.-H., Monroe, D., Silverman, P.J., Kuo, J.M., Kortan, A.R., Thiel, F.A., Weir, B.E.: Relaxed GexSi1-x structures for III–V integration with Si and high mobility two-dimensional electron gases in Si. J. Vac. Sci. Technol. B 10(4), 1807–1819 (1992)
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