Preparation of Ni/Al2O3 catalysts from vapor phase by atomic layer epitaxy-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Preparation of Ni/Al2O3 catalysts from vapor phase by atomic layer epitaxy

Published:1994 Issue:3-4 Volume:27 Page:323-336
ISSN:1011-372X
Container-title:Catalysis Letters
language:en
Short-container-title:Catal Lett

Author:

Lindblad Marina,Lindfors Lars Peter,Suntola Tuomo

Publisher

Springer Science and Business Media LLC

Subject

General Chemistry,Catalysis

Link

http://link.springer.com/content/pdf/10.1007/BF00813919.pdf

Reference16 articles.

1. T. Suntola, Mater. Sci. Rep. 4 (1989) 261.

2. T. Suntola and J. Antson, US Patent No. 4058430 (1977).

3. T. Suntola, E.-L. Lakomaa, H. Knuuttila, P. Knuuttila, O. Krause and S. Lindfors, FI84562.

4. T. Suntola et al., FI 87892 (1993).

5. E.-L. Lakomaa, Appl. Surf. Sci., in press.

Cited by 85 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ni deposition on TiO2 from organometallic ligand for photocatalytic hydrogen production;Applied Catalysis O: Open;2024-08

2. Selective Detection of H₂ Gas in Gas Mixtures Using NiO‐Shelled Pd‐Decorated ZnO Nanowires;Advanced Materials Technologies;2024-04-09

3. Atomic Layer Deposition of Zinc Oxide on Mesoporous Zirconia Using Zinc(II) Acetylacetonate and Air;Chemistry of Materials;2023-09-29

4. Supported Ni Catalysts: Simple Vapor Deposition Preparation Method and Improved Catalytic Performance for Oxidative Dehydrogenation of Ethane;ACS Omega;2023-09-08

5. High crystalline epitaxial thin films of NiO by plasma-enhanced ALD and their properties;APL Materials;2023-09-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP