Temperature Induces Self-assembly of Silicon Nano/Micro-structure based on Multi-physics Approach
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science
Link
http://link.springer.com/content/pdf/10.1007/s11595-018-1899-4.pdf
Reference25 articles.
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2. Sudoh K, Iwasaki H, Kuribayashi H, et al. Numerical Study on Shape Transformation of Silicon Trenches by High-temperature Hydrogen Annealing[J]. Japanese Journal of Applied Physics, 2004, 43(9A): 5937–5941
3. Sato T, Mitsutake K, Mizushima I, et al. Micro-structure Transformation of Silicon: A Newly Developed Transformation Technology for Patterning Silicon Surfaces Using the Surface Migration of Silicon Atoms by Hydrogen Annealing[J]. Japanese Journal of Applied Physics, 2000, 39(9A): 5033–5038
4. Sato T, Mizushima I, Taniguchi S, et al. Fabrication of Silicon-on-nothing Structure by Substrate Engineering Using the Empty-space-in-silicon Formation Technique[J]. Japanese Journal of Applied Physics, 2004, 43(1): 12–18
5. Depauw V, Gordon I, Beaucarne G, et al. Large-area Monocrystalline Silicon Thin Films by Annealing of Macroporous Arrays: Understanding and Tackling Defects in the Material[J]. Journal of Applied Physics, 2009, 106(3): 033516–10
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