Etching of chemically vapour-deposited amorphous Si3N4-C composites in HF solution-Reference-Cited by-同舟云学术

Etching of chemically vapour-deposited amorphous Si3N4-C composites in HF solution

Published:1983-11 Issue:11 Volume:18 Page:3387-3392
ISSN:0022-2461
Container-title:Journal of Materials Science
language:en
Short-container-title:J Mater Sci

Author:

Goto Takashi,Hirai Toshio

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00544164.pdf

Reference17 articles.

1. C. A. Deckert, J. Electrochem. Soc. 127 (1980) 2433.

2. T. Hirai and T. Goto, J. Mater. Sci. 16 (1981) 17.

3. F. Itoh, T. Honda, T. Goto, T. Hirai and K. Suzuki, Proceedings of the 8th International Conference on Chemical Vapor Deposition, Gouvieux-Chantilly, France, September 1981, edited by J. M. Blocher Jr, G. E. Vuillard and G. Wahl (Electrochemical Society, Pennington, 1981) p. 277.

4. T. Hirai and T. Goto, J. Mater. Sci. 16 (1981) 2877.

5. T. Goto, S. Hayashi and T. Hirai, Sci. Rep. RITU A29 (1981) 176.

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