Photoelectrochemically combined mechanical polishing of n-type gallium nitride wafer by using metal nanoparticles as photocathodes-Reference-Cited by-同舟云学术

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Photoelectrochemically combined mechanical polishing of n-type gallium nitride wafer by using metal nanoparticles as photocathodes

Published:2019-01-21 Issue:11 Volume:105 Page:4483-4489
ISSN:0268-3768
Container-title:The International Journal of Advanced Manufacturing Technology
language:en
Short-container-title:Int J Adv Manuf Technol

Author:

Ou Liwei,Dong Zhigang,Kang Renke,Shi Kang,Guo Dongming

Funder

the National Natural Science Foundation of China

the National key Research and Development Program of China

the National Science and Technology Major Project of China

Publisher

Springer Science and Business Media LLC

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Software,Control and Systems Engineering

Link

http://link.springer.com/article/10.1007/s00170-018-03279-5/fulltext.html

Reference34 articles.

1. Xu X, Vaudo RP, Brandes GR (2003) Fabrication of GaN wafers for electronic and optoelectronic devices. Opt Mater 23:1–5. https://doi.org/10.1016/S0925-3467(03)00051-X

2. Pearton SJ, Zolper JC, Shul RJ, Ren F (1999) GaN: processing, defects, and devices. J Appl Phys 86:1–78. https://doi.org/10.1063/1.371145

3. Fujii K, Karasawa K, Ohkawa K (2005) Hydrogen gas generation by splitting aqueous water using n-type GaN photoelectrode with anodic oxidation. Jpn J Appl Phys 44:L543–L545. https://doi.org/10.1143/JJAP.44.L543

4. Ebrahimi M, Hanzaki AZ, Abedi HR, Azimi M, Mirjavadi SS (2017) Correlating the microstructure to mechanical properties and wear behavior of an accumulative back extruded Al-Mg2Si in-situ composite. Tribol Int 115:199–211. https://doi.org/10.1016/j.triboint.2017.05.034

5. Cheng K, Huo D (2013) Micro cutting: fundamentals and applications. Wiley, Chichester

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