Modeling and investigation on wafer shape in wafer rotational grinding method

Author:

Tang Keyan,Kang Renke,Guo Dongming,Song Li

Publisher

Springer Science and Business Media LLC

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Software,Control and Systems Engineering

Reference18 articles.

1. Quirk M, Serda J (2004) Semiconductor manufacturing technology. Publishing House of Electronics Industry, Beijing

2. Liu ZJ, Zheng AS (2004) Semiconductor materials. Chemical Industry Press, Beijing

3. Guo DM, Kang RK, Jin ZJ (2003) High-productivity ultra-precise machining technique of silicon wafer with dia. over 300mm. World Manuf Eng Market 20(1):35–40

4. Pei ZJ, Xin XJ, Liu W (2003) Finite element analysis for grinding of wire-sawn silicon wafers: a designed experiment. Int J Mach Tool Manuf 43:7–16

5. Hsieh S, Hou KC (2006) Production-flow-value-based job dispatching method for semiconductor manufacturing. Int J Adv Manuf Technol 30(7–8):727–737

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