Wet Cleaning (Part 1): Removal of Particulate Contaminants-Reference-Cited by-同舟云学术

Wet Cleaning (Part 1): Removal of Particulate Contaminants

Published:1998 Issue: Volume: Page:451-461
ISSN:
Container-title:Ultraclean Surface Processing of Silicon Wafers
language:
Short-container-title:

Author:

Kawahara Hiroyuki

Publisher

Springer Berlin Heidelberg

Link

http://link.springer.com/content/pdf/10.1007/978-3-662-03535-1_33

Reference15 articles.

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3. W. kern: RCA Engineer, 99 (July/August 19253).

4. T. Shimono and M. Tsuji: Spring Meeting of Electrochem. Soc., Ext. Abstracts, 278 (1991).

5. R. Takizawa and A. Osawa: Ext. Abstracts No. 387, 1st Int. Symp. on Clean- ing Technology in Semiconductor Device Manufacturing, Electrochemical Society, 564 (1989).

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