Ultraclean Technology for VLSI Manufacturing: An Overview-Reference-Cited by-同舟云学术

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Ultraclean Technology for VLSI Manufacturing: An Overview

Published:1998 Issue: Volume: Page:3-17
ISSN:
Container-title:Ultraclean Surface Processing of Silicon Wafers
language:
Short-container-title:

Author:

Hattori Takeshi

Publisher

Springer Berlin Heidelberg

Link

http://link.springer.com/content/pdf/10.1007/978-3-662-03535-1_1

Reference15 articles.

1. T. Hattori: Microelectric Manufacturing and Testing 11(4), 31 (1988).

2. T. Hattori: Solid State Technology 33 (7), S1 (1990).

3. T. Hattori: Contamination Control and Defect Reduction in Semiconductor Manufacturing III, The Electrochemical Society, Pennington, p. 3 (1994).

4. Nikkei Microdevices, p. 94 (August 1990).

5. T. Hattori: Microcontamination 10 (10), 18 (1992).

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of Cu Concentration on the Getter Efficiency of Dislocations and Oxygen Precipitates in Silicon Wafers;Solid State Phenomena;2013-10

2. Comparisons of Various Physical Cleaning;Solid State Phenomena;2012-04

3. Analysis of Time-Dependent Haze on Silicon Surfaces;Journal of The Electrochemical Society;2003

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