Kalman filtering-based supervisory run-to-run control method for semiconductor diffusion processes
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Computer Science
Link
http://link.springer.com/article/10.1007/s11432-018-9593-1/fulltext.html
Reference8 articles.
1. Sachs E, Hu A, Ingolfsson A. Run by run process control: combining SPC and feedback control. IEEE Trans Semicond Manufact, 1995, 8: 26–43
2. Tan F, Pan T H, Li Z M, et al. Survey on run-to-run control algorithms in high-mix semiconductor manufacturing processes. IEEE Trans Ind Inf, 2015, 11: 1435–1444
3. Butler S W, Stefani J A. Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry. IEEE Trans Semicond Manufact, 1994, 7: 193–201
4. Tseng S T, Tsung F, Liu P Y. Variable EWMA run-torun controller for drifted processes. IIE Trans, 2007, 39: 291–301
5. Kim H, Park J H, Lee K S. A Kalman filter-based R2R control system with parallel stochastic disturbance models for semiconductor manufacturing processes. J Process Control, 2014, 24: 119–124
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1. A general tool-based multi-product model for high-mixed production in semiconductor manufacturing;International Journal of Production Research;2023-02-09
2. Adaptive Weight Tuning of EWMA Controller via Model-Free Deep Reinforcement Learning;IEEE Transactions on Semiconductor Manufacturing;2023-02
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