Author:
Bag S. K.,Mainardi Daniela S.,Mahalik N. P.
Reference82 articles.
1. Allen DM (1986) The principles and practice of photochemical machining and photoetching. Inst of Physics Pub Inc., pp 1–18
2. Allen MG, Mehregany M, Howe RT, Senturia SD (1987) Microfabricated structures for the in situ measurement of residual stress, Young’s modulus and ultimate strain of thin films, Appl. Phys. Lett. 51:241–243
3. Alley RL, Cuan GJ, Howe RT, Komvopoulos K (1988) The effect of release etch processing on surface microstructure stiction. echnical Digest of the Solid-State Sensor and Actuator Workshop, Hilton Head Island, pp 202–207
4. Allongue P, Kieling VC, Gerischer H (1993) Etching of Si in NaOH solutions, Part I and II, J. Electrochem. Soc. 40:1009–1018 and 40:1018-1026
5. Ammar ES, Rodgers TJ (1980) UMOS transistors on (110) silicon, IEEE Trans. Electron Devices ED-27:907–914