The Impact of Surface Passivation on Kapitza Resistance at the Interface Between a Semiconductor and Liquid Nitrogen

Abstract

AbstractCooling electronic devices to cryogenic temperatures (< 77 K) is crucial in various scientific and engineering domains. Efficient cooling involves the removal of heat generated from these devices through thermal contact with either a liquid cryogen or a dry cryostat cold stage. However, as these devices cool, thermal boundary resistance, also known as Kapitza resistance, hinders the heat flow across thermal interfaces, resulting in elevated device temperatures. In transistors, the presence of passivation layers like silicon nitride (SiN) introduces additional interfaces that further impede heat dissipation. This paper investigates the impact of passivation layer thickness on Kapitza resistance at the interface between a solid device and liquid nitrogen. The Kapitza resistance is measured using a capacitance thermometer that has been passivated with SiN layers ranging from 0 to 240 nm. We observe that Kapitza resistance increases with increasing passivation thickness.