Preparation of pyramid–SiNWs binary structure with Ag nanoparticles-assisted chemical etching
Author:
Publisher
Springer Science and Business Media LLC
Subject
Materials Chemistry,Metals and Alloys,Physical and Theoretical Chemistry,Condensed Matter Physics
Link
http://link.springer.com/content/pdf/10.1007/s12598-015-0608-0.pdf
Reference15 articles.
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3. Striemer CC, Fauchet PM. Dynamic etching of silicon for broadband antireflection applications. Appl Phys Lett. 2002;81(16):2980.
4. Deinega A, Valuev I, Potapkin B, Lozovik Y. Antireflective properties of pyramidally textured surfaces. Opt Lett. 2010;35(2):106.
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