Author:
Kunka Danays,Mohr Jürgen,Nazmov Vladimir,Meiser Jan,Meyer Pascal,Amberger Maximilian,Koch Frieder,Schulz Joachim,Walter Marco,Duttenhofer Thomas,Voigt Anja,Ahrens Gisela,Grützner Gabi
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference7 articles.
1. Kenntner J, Grund T, Matthis B, Boerner M, Mohr J, Scherer T, Walter M, Willner M, Tapfer A, Bech M, Pfeiffer F, Zanette I, Weitkamp T (2010) Front- and backside structuring of gratings for phase contrast imaging with x-ray tubes. In: Proceedings of SPIE vol 7804, p 780408
2. McCord MA, Rooks MJ (2004) Resists in SPIE handbook of microlithography, micromachining and microfabrication. In: Rai-Choudhury (ed) Microlithography, vol 1, Section 2.7
3. Meyer P (2012) Fast and accurate X-ray lithography simulation enabled by using Monte Carlo method. New version of DoseSim: a software dedicated to deep X-ray lithography (LIGA). Microsyst Technol 18(12):1971–1980. doi: 10.1007/s00542-012-1637-3
4. Meyer P, Schulz J, Hahn L (2003) DoseSim: microsoft-Windows graphical user interface for using synchrotron X-ray exposure and subsequent development in the LIGA process. Rev Sci Instrum 74(2):1113–1119. doi: 10.1063/1.1532542
5. Mohr J, Grund T, Kunka D, Kenntner J, Leuthold J, Meiser J, Schulz J, Walter M (2012) High aspect ratio gratings for X-ray phase contrast imaging. AIP Conf Proc 1466:41–50
Cited by
13 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献