Fabrication of high aspect ratio nano gratings using SR lithography-Reference-Cited by-同舟云学术

Fabrication of high aspect ratio nano gratings using SR lithography

Published:2006-06-27 Issue:3-4 Volume:13 Page:221-225
ISSN:0946-7076
Container-title:Microsystem Technologies
language:en
Short-container-title:Microsyst Technol

Author:

Kato Fumiki,Fujinawa Shinya,Li Yigui,Sugiyama Susumu

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s00542-006-0215-y.pdf

Reference6 articles.

1. Born M, Wolf E (1997) Principles of optics. Cambridge University Press, Cambridge

2. Imai A et al (1996) KrF excimer laser lithography for gigabit-scale DRAM. Microlithography World, Summer 1996, 9–16

3. Kress B, Meyruesis P (2000) Digital diffractive optics. Wiley, New York

4. Shank M et al (1994) Fabrication of multi-level phase gratings using focused ion beam milling and electron beam lithography. OSA Tech Dig 11:302–306

5. Swanson GJ (1989) Binary optics technology: the theory and design of multi-level diffractive optical elements. DARPA Technical Report 854

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