Megasonic cleaning: A new cleaning and drying system for use in semiconductor processing-Reference-Cited by-同舟云学术

Megasonic cleaning: A new cleaning and drying system for use in semiconductor processing

Published:1979-11 Issue:6 Volume:8 Page:855-864
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:JEM

Author:

Mayer A.,Shwartzman S.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/BF02651188.pdf

Reference2 articles.

1. A. Mayer and S. Shwartzman U.S. Patent 3,893,869, July 8, (1975); assigned to RCA Corporation. The following companies are licensed by RCA to build cleaning systems: Fluorocarbon P.O. Box 3640 1432 South Allec St. Anaheim, California 92803 Interlab Inc. Precision Rd Danbury, Ct. 06810 Southern Scientific Associates, Inc. 304 Cynthia Lane Indian Harbour Beach, Florida 32935

2. W, Kern and D.A. Puotinen, RCA Review31, 187, (1970),

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