Speckle Interferometric Investigation of Argon Pressure-Induced Surface Roughness Modifications in RF-Sputtered MoO3 Film
Author:
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials
Link
http://link.springer.com/content/pdf/10.1007/s10921-020-00741-x.pdf
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4. Chaoumead, A., Sung, Y., Kwak, D.-J.: The effects of RF sputtering power and gas pressure on structural and electrical properties of ITiO thin film. Adv. Condens. Matter Phys. 2012, 1–7 (2012)
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