Author:
Smyrnakis Athanasios,Zeniou Angelos,Awsiuk Kamil,Constantoudis Vassilios,Gogolides Evangelos
Publisher
Springer Science and Business Media LLC
Subject
General Chemical Engineering
Reference32 articles.
1. Gogolides E, Vassilios C, George K, Dimitrios K, Katerina T, George B, Marilena V, Angeliki T. Controlling roughness: From etching to nanotexturing and plasma-directed organization on organic and inorganic materials. Journal of Physics. D, Applied Physics, 2011, 44(17): 174021
2. Franssila S. Optical Lithography. Introduction to Microfabrication. Hoboken: John Wiley & Sons, Ltd., 2010, 103–113
3. Stulen R H, Sweeney D W. Extreme ultraviolet lithography. IEEE Journal of Quantum Electronics, 1999, 35(5): 694–699
4. Pfeiffer H C. Direct write electron beam lithography: A historical overview. In: Proceedings of SPIE Photomask Technology. Monterey: SPIE, 2010, 782316
5. Chou S Y, Krauss P R, Renstrom P J. Nanoimprint lithography. Journal of Vacuum Science & Technology. B, 1996, 14(6): 4129–4133
Cited by
4 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献