SIMS of Organic Materials—Interface Location in Argon Gas Cluster Depth Profiles Using Negative Secondary Ions
Author:
Affiliation:
1. National Physical Laboratory, Teddington, TW11 0LW, Middlesex, UK
2. Universita degli Studi di Cagliari, Dipartimento di Fisica S. P. Monserrato, Sestu Km 0.700, 09042, Monserrato, CA, Italy
Funder
Horizon 2020 Framework Programme
Department of Business, Energy and Industrial Strategy
Publisher
American Chemical Society (ACS)
Subject
Spectroscopy,Structural Biology
Link
http://link.springer.com/article/10.1007/s13361-018-1905-2/fulltext.html
Reference31 articles.
1. Dopant spatial distributions: Sample-independent response function and maximum-entropy reconstruction
2. Secondary ion mass spectrometry analysis of ultrathin impurity layers in semiconductors and their use in quantification, instrumental assessment, and fundamental measurements
3. Characterization of sharp interfaces and delta doped layers in semiconductors using secondary ion mass spectrometry
4. On determining accurate positions, separations, and internal profiles for delta layers
5. Recoil mixing in high-fluence ion implantation
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. High-Resolution Molecular Secondary Ion Mass Spectrometry for Absolute Quantification of Materials in Low-Dimensional Structures: Foundation, Perception and Challenges;Handbook of Materials Science, Volume 1;2023-11-22
2. Nanoscale 3D Tomography by In-Flight Fluorescence Spectroscopy of Atoms Sputtered by a Focused Ion Beam;Nano Letters;2022-10-10
3. Behavior and process of background signal formation of hydrogen, carbon, nitrogen, and oxygen in silicon wafers during depth profiling using dual‐beam TOF‐SIMS;Surface and Interface Analysis;2021-11-16
4. Gas Cluster Ion Beam Cleaning of CVD-Grown Graphene for Use in Electronic Device Fabrication;ACS Applied Nano Materials;2021-05-11
5. Ion yield enhancement at the organic/inorganic interface in SIMS analysis using Ar-GCIB;Applied Surface Science;2021-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3