Low-pressure pyrolysis studies of a new phosphorus precursor: Tertiarybutylbis(dimethylamino)phosphine-Reference-Cited by-同舟云学术

Low-pressure pyrolysis studies of a new phosphorus precursor: Tertiarybutylbis(dimethylamino)phosphine

Published:1996-09 Issue:9 Volume:25 Page:1434-1438
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:JEM

Author:

Hill C. W.,Gedridge R. W.,Groshens T. J.,Stringfellow G. B.,Wick L. P. Sad

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/BF02655379.pdf

Reference25 articles.

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2. C.R. Abernathy, D.A. Bohling, G.T. Muhr and P.W. Wisk,Compound Semiconductor Epitaxy, 340, (Pittsburgh, PA: Mater. Res. Soc., 1994), p. 161.

3. L.P. Sadwick, C.W. Kim, H.H. Ryu, C.W. Hill, G.B. Stringfellow, R.W. Gedridge, Jr. and A.C. Jones,Compound Semiconductor Epitaxy, 340, (Pittsburgh, PA: Mater. Res. Soc., 1994), p. 167.

4. C.W. Kim, G.B. Stringfellow and L.P. Sadwick,J. Cryst. Growth, to be published.

5. G. Zimmermann, H. Protzmann, T. Marscher, O. Zsebok, W. Stolz, E.O. Gobel, P. Gimmnich, J. Lorberth, T. Filz, P. Kurpas and W. Richter,J. Cryst. Growth 129, 37 (1993).

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