The scaling of CVD rotating disk reactors to large sizes and comparison with theory-Reference-Cited by-同舟云学术

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The scaling of CVD rotating disk reactors to large sizes and comparison with theory

Published:1996-09 Issue:9 Volume:25 Page:1487-1494
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:JEM

Author:

Thompson Alan G.,Stall R. A.,Zawadzki P.,Evans G. H.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/BF02655388.pdf

Reference24 articles.

1. B. Roberts, A. Harms and R.L. Jackson,Solid State Tech. 38, 69 (February, 1995).

2. Electron. News, p. 50 (January 9, 1995).

3. High Speed Semiconductor Devices, ed. S.M. Sze, (New York: Wiley, 1990).

4. A.G. Thompson et al.,III-V Review 8, (3), 14 (1995).

5. M.A. McKee et al.,Mater. Res. Soc. Symp. Proc. 340, (Pittsburgh, PA: Mater. Res. Soc., 1994), p. 141.

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