1. Madou, M. J.: Fundamentals of microfabrication and nanotechnology, vol. II, pp. 233 ff. CRC Press Boca Raton (2012)
2. Seidel, H. et al.: Anisotropic Etching of Crystalline Silicon in Alkaline Solutions: I . Orientation Dependence and Behavior of Passivation Layers J. Electrochem. Soc. 137, 3612 (1990)
3. Heuberger, A.: Mikromechanik. Springer, Berlin (1991)
4. Ruge, I.: Halbleiter-Technologie, Series Halbleiter-Elektronik, vol. 4. Springer, Berlin (1984)
5. Schutz, R.J.: Reactive Plasma Etching. In Sze, S.M. (ed.) VLSI Technology, pp. 212 ff. McGraw-Hill Boston (1988)