Multi-layer alignment control of a large area nano-imprinting stage

Author:

Yim Hong Jae,Lee Yong Hoon,Lee Sung Hoon,Il Jeong Jay,Lim Si-Hyung

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials

Reference5 articles.

1. J. Kim, Stability Analysis of Micro Stage Using FEM and Nano Position Control, Proceedings of The Korean Society of Manufacturing Process Engineers, Annual Fall Conference, Korea (2003) 166–169.

2. C. Lee, An ultraprecision stage for alignment of wafers in advanced microlithography, Precision Engineering, Journal of the American Society of Precision Engineering 21(2) (1997) 113–122.

3. D. Shin, Measurement and Correction of PCB Alignment Error for Screen Printer Using Machine Vision, Journal of the Korean Society of Precision Engineering 20(6) (2003) 88–95.

4. M. Kang, Structural analysis and multi-body kinematics and dynamics of a nano-imprinting machine using CAE method, Proceedings of the KSME 2006 Fall Annual Meeting, Korea (2006) 102–108.

5. K. Lee, S. Lim, H. Yim, Dynamic Analysis of a Nano Imprinting Stage Using CAE, Transactions of the Korean Society of Machine Tool Engineers 16(5) (2007) 211–217.

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