Deposition of silicon films in presence of nitrogen plasma—A feasibility study-Reference-Cited by-同舟云学术

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Deposition of silicon films in presence of nitrogen plasma—A feasibility study

Published:2002-10 Issue:5 Volume:25 Page:399-402
ISSN:0250-4707
Container-title:Bulletin of Materials Science
language:en
Short-container-title:Bull Mater Sci

Author:

Patil Sheetal J.,Bodas Dhananjay S.,Phatak G. J.,Gangal S. A.

Publisher

Springer Science and Business Media LLC

Subject

Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF02708017.pdf

Reference18 articles.

1. Bunshah R F 1989Thin Solid Films 107 21

2. Chin J and Elsner N B 1975J. Vac. Sci. Technol. 12 821

3. Cotler T J and Chapple Sockol J 1993J. Electrochem. Soc. 140 2071

4. Hirohata Y, Shimamoto N, Yamashima T and Yabe K 1994Thin Solid Films 425-9 253

5. Hu S M 1966J. Electrochem. Soc. 113 693

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