Carbonitriding of silicon using plasma focus device-Reference-Cited by-同舟云学术

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Carbonitriding of silicon using plasma focus device

Published:2009-03 Issue:2 Volume:27 Page:381-387
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Jabbar S.,Khan I. A.,Ahmad R.,Zakaullah M.,Pan J. S.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3085720

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermal and Dielectric Behaviour of Polymer-Based Nanocomposites Flexible Sheets as Highly Stable Dielectric Materials;International Journal of Polymer Science;2023-01-05

2. Structural and optical properties of broccoli-based nanostructured ZnS films synthesized by powder vapor transport technique;Optical and Quantum Electronics;2022-12-21

3. X-ray emission from tin (Sn) using the AECS PF-2 plasma focus device;Radiation Physics and Chemistry;2022-09

4. Role of annealing temperature on structural and optical properties of zinc oxy-nitride films synthesized by powder vapor transport technique;Ceramics International;2022-06

5. Research with plasma foci in countries of Asia, Africa, and Latin America;Reviews of Modern Plasma Physics;2020-04-09

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