Run-to-run control of inductively coupled C2F6 plasma etching of SiO2: Multivariable controller design and numerical application
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Chemical Engineering,General Chemistry
Link
http://link.springer.com/content/pdf/10.1007/BF02705716.pdf
Reference10 articles.
1. Badgwell, T. A., Breedijk, S. G., Bushman, S. G., Butler, S. W., Chatterjee, S., Edgar, T. F., Toprac, A. J. and Trachtenberg, I., “Modeling and control of microelectronics materials processing,”Comp. & Chem. Eng.,19, 1 (1995).
2. Edgar, T. F., Butler, S. W., Campbell, W. J., Pfeiffer, C., Bode, C., Hwang, S. B., Balakrishnan, K. S. and Hahn, J., “Automatic control in micro-electronics manufacturing: practice, challenges, and possibilities,”Automatica,36, 1567 (2000).
3. Hankinson, M., Vincent, T. and Irani, K. B., “Integrated real-time and R2R control of etch depth in reactive ion etching,”IEEE Trans. Semi-conduct. Manufact.,10, 121 (1997).
4. Kim, B. W., Kim, S. M. and Kim, K. H., “Modeling of plasma etching using a generalized regression neural network,”Vacuum,71, 497 (2003).
5. Kim, W. C., Chin, I. S., Lee, K. S. and Choi, J. H., “Analysis and reduced-order design of quadratic criterion-based iterative learning control using singular value decomposition,”Comp. & Chem. Eng.,24, 1815 (2000).
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Principal Component Analysis Based Support Vector Machine for the End Point Detection of the Metal Etch Process;IFAC Proceedings Volumes;2008
2. Study of Silicon Oxidation in a Remote Plasma-Enhanced Rapid Thermal Processor;Journal of the Korean Physical Society;2007-10-15
3. DEVELOPMENT OF ENDPOINT DETECTION ALGORITHM IN THE MULTI-STEP PLASMA ETCHING PROCESS;IFAC Proceedings Volumes;2007
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3