Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities

Author:

Edgar Thomas F.,Butler Stephanie W.,Campbell W.Jarrett,Pfeiffer Carlos,Bode Christopher,Hwang Sung Bo,Balakrishnan K.S.,Hahn J.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Control and Systems Engineering

Reference122 articles.

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3. Aral, G., Merchant, T., Cole, J. V., Knutson, K., & Jensen, K. (1994). Concurrent engineering of an RTP reactor: Design for control. Proceedings of RTP conference (pp. 288–295).

4. Modeling and control of microelectronics materials processing;Badgwell;Computers and Chemical Engineering,1995

5. Modeling the wafer temperature profile in a multiwafer LPCVD furnace;Badgwell;Journal of the Electrochemical Society,1994

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