Process Variation Study of SELBOX Inverted- T Junctionless FinFET for High-Performance Applications
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electronic, Optical and Magnetic Materials
Link
http://link.springer.com/content/pdf/10.1007/s12633-019-00270-x.pdf
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5. Pradhan KP, Sahu PK (2016) Exploration of symmetric high- k spacer (SHS) hybrid FinFET for high performance application. Superlattice Microst 90:191–197
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