Process Variation Study of SELBOX Inverted- T Junctionless FinFET for High-Performance Applications
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electronic, Optical and Magnetic Materials
Link
http://link.springer.com/content/pdf/10.1007/s12633-019-00270-x.pdf
Reference26 articles.
1. Hu C. (2001) in Device research conference. Conference digest, p. 3–4
2. Claudio F, Yang Y, Sangiorgi E, O'Neill AG (2008). IEEE Trans. Electron Devices 55:233–244
3. Weimin Z, Fossum JG, Mathew L (2006). IEEE Trans Electron Devices 53:2335–2343
4. Fahad HM, Hu C, Hussain MM (2015) Simulation Study of a 3-D Device Integrating FinFET and UTBFET. IEEE Trans. Electron Devices 62:83–87
5. Pradhan KP, Sahu PK (2016) Exploration of symmetric high- k spacer (SHS) hybrid FinFET for high performance application. Superlattice Microst 90:191–197
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. DESIGN AND ANALYSIS OF ELECTRICAL CHARACTERISTICS OF INVERTED-T JUNCTIONLESS (JL) FET THROUGH GEOMETRIC AND PROCESS VARIATIONS FOR HIGH FREQUENCY APPLICATIONS;Suranaree Journal of Science and Technology;2024-02-21
2. A breakthrough for temperature and linearity stability from device to circuit-level with 14 nm junctionless SOI FinFET: Advancing K-band LNA performance;Microelectronics Reliability;2024-01
3. Doping-less MultiGate Inverted-T shape FET device with Schottky source/drain contacts;Microelectronics Journal;2024-01
4. Memoryless nonlinearity in IT JL FinFET with spacer technology: Investigation towards reliability;Microelectronics Reliability;2021-04
5. Design and Performance Evaluation of Sub-10 nm Gaussian Doped Junctionless SOI and SELBOX FinFET;Silicon;2020-08-24
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3