Optimization of Preparation Conditions to Control Structural Characteristics of Silicon Dioxide Nanostructures Prepared by Magnetron Plasma Sputtering-Reference-Cited by-同舟云学术

Optimization of Preparation Conditions to Control Structural Characteristics of Silicon Dioxide Nanostructures Prepared by Magnetron Plasma Sputtering

Published:2017-11-04 Issue:4 Volume:10 Page:1411-1418
ISSN:1876-990X
Container-title:Silicon
language:en
Short-container-title:Silicon

Author:

Hameed Mohammed A.,Jabbar Zahraa M.

Publisher

Springer Science and Business Media LLC

Subject

Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/article/10.1007/s12633-017-9618-x/fulltext.html

Reference42 articles.

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4. Choi J-K, Kim D, Lee J, Yoo J-B (2000) Effects of process parameters on the growth of thick SiO2 using plasma enhanced chemical vapor deposition with hexamethyldisilazane. Surf Coat Technol 131:136–140

5. Bang SB, Chung TH, Kim Y, Kang MS, Kim JK (2004) Effects of the oxygen fraction and substrate bias power on the electrical and optical properties of silicon oxide films by plasma enhanced chemical vapour deposition using TMOS/O2 gas. J Phys D: Appl Phys 37:1679–1684

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