Performance Analysis of Dual Material Junction Accumulation Mode tri gate Junctionless SOI FET: Modeling and Simulation
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electronic, Optical and Magnetic Materials
Link
https://link.springer.com/content/pdf/10.1007/s12633-021-01483-9.pdf
Reference45 articles.
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2. Dash S, Mishra GP (2016) An extensive electrostatic analysis of dual material gate all around tunnel FET (DMGAA-TFET). Adv Nat Sci: Nanosci Nanotechnol 7(025012):10–7. https://doi.org/10.1088/2043-6262/7/2/025012
3. Sahay S, Kumar MJ (2017) Symmetric operation in an extended back gate JLFET for scaling to the 5-nm regime considering quantum confinement effects. IEEE Trans Electron Devices 64(1):21–27. https://doi.org/10.1109/TED.2016.2628763
4. Choi S-J, Moon D-I, Kim S, Duarte JP, Choi Y-K (2011) Sensitivity of threshold voltage to nanowire width variation in Junctionless transistors. IEEE Electron Device Lett 32(2):125–127. https://doi.org/10.1109/LED.2010.2093506
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