1. Lebedev, Yu.A.,J. Phys. Paris, 1998, vol. 8, p. 369.
2. Batanov, G.M., Berezhetskaya, N.K., Bol’shakov, E.F.,et al., Plasma Sources Sci. Technol., 1993, vol. 2, no. 1, p. 164.
3. Brovkin, V.G., Kolesnichenko, Yu.F., and Khmara, D.,Prikl. Fiz., 1994, issue 4, p. 5.
4. Bardos, L., Barankova, H., Lebedev, Yu.A.,et al., Diamond Deposition in a Microwave Electrode Discharge at Reduced Pressures,Diamond Relat. Mater., 1997, vol. 6, p. 224.
5. Bardos, L., Barankova, H., and Lebedev, Yu.A., Effective Low Power Microwave Plasma CVD of Carbon Nitride Films, inProc. SVC TC (1999). Paper E-7 (42nd Annual Conf. of the Society of Vacuum Coaters, Chicago, 1999).