Importance of interfacial step alignment in hetero-epitaxy and orientation relationships: the case of Ag equilibrated on Ni substrates. Part 1 computer simulations-Reference-Cited by-同舟云学术

Importance of interfacial step alignment in hetero-epitaxy and orientation relationships: the case of Ag equilibrated on Ni substrates. Part 1 computer simulations

Published:2015-05-14 Issue:15 Volume:50 Page:5262-5275
ISSN:0022-2461
Container-title:Journal of Materials Science
language:en
Short-container-title:J Mater Sci

Author:

Wynblatt Paul,Chatain Dominique

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/s10853-015-9074-1.pdf

Reference38 articles.

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2. Chatain D, Wynblatt P, Rollett AD, Rohrer GS (2015) Importance of interfacial step alignment in hetero-epitaxy and orientation relationships: The case of Ag equilibrated on Ni substrates. Part 2 experiments. J Mater Sci. doi: 10.1007/s10853-015-9075-0

3. Du R, Flynn CP (1990) Asymmetric coherent tilt boundaries formed by molecular beam epitaxy. J Phys 2:1335–1341

4. Hirth JP, Pond RC (2010) Strains and rotations in thin deposited films. Philos Mag 90:3129–3147

5. Hirth JP (1994) Dislocations, steps and disconnections at interfaces. J Phys Chem Solids 55:985–989

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