Effect of interface structure on the Ru on HfO2 work function-Reference-Cited by-同舟云学术

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Effect of interface structure on the Ru on HfO2 work function

Published:2010-02-09 Issue:18 Volume:45 Page:4924-4928
ISSN:0022-2461
Container-title:Journal of Materials Science
language:en
Short-container-title:J Mater Sci

Author:

Mukhopadhyay Atashi B.,Sanz Javier Fdez,Musgrave Charles B.

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/s10853-010-4274-1.pdf

Reference19 articles.

1. Wilk GD, Wallace RM, Anthony JM (2001) J Appl Phys 89:5243

2. Suh YS, Lazar H, Chen B, Lee JH, Mishra V (2005) J Electrochem Soc 152(9):F138

3. Kim JH, Yoon SG, Yeom SJ, Woo HK, Kil DS, Roh JS, Sohn HC (2005) Electrochem Solid-State Lett 8(6):F17

4. Sullivan JP, Tung RT, Pinto MR, Graham WR (1991) J Appl Phys 70(12):7403

5. Miura S, Tsunoda M, Takahashi M (2001) J Appl Phys 89:6308

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Charge injection barriers at metal/polyethylene interfaces;Journal of Materials Science;2015-09-02

2. Effect of Surface Deposited Pt on the Photoactivity of TiO2;The Journal of Physical Chemistry C;2012-04-30

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