Nanoscale atomic lithography with a cesium atomic beam-Reference-Cited by-同舟云学术

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Nanoscale atomic lithography with a cesium atomic beam

Published:1997-09-01 Issue:3 Volume:65 Page:419-421
ISSN:0946-2171
Container-title:Applied Physics B: Lasers and Optics
language:
Short-container-title:Applied Physics B: Lasers and Optics

Author:

Lison F.,Adams H.-J.,Haubrich D.,Kreis M.,Nowak S.,Meschede D.

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://link.springer.com/content/pdf/10.1007/s003400050290.pdf

Cited by 61 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Efficient 2D molasses cooling of a cesium beam using a blue detuned top-hat beam;The European Physical Journal D;2022-02

2. Self-traceable nano-grating frequency doubling based on polarization gradient light field;International Conference on Optoelectronic and Microelectronic Technology and Application;2020-12-04

3. Deposition of Cr Atoms Using Switching-Detuning Light Mask for Direct Atom Lithography;Current Nanoscience;2019-10-11

4. Introduction;Neutral Atom Imaging Using a Pulsed Electromagnetic Lens;2017-11-01

5. Communication: Neutral atom imaging using a pulsed electromagnetic lens;The Journal of Chemical Physics;2017-02-28

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