Designing a New Lattice Model to Simulate Low-molecular-weight Block Copolymers for Nanolithographic Applications
Author:
Publisher
Springer Science and Business Media LLC
Subject
Polymers and Plastics,Organic Chemistry,General Chemical Engineering
Link
https://link.springer.com/content/pdf/10.1007/s10118-022-2677-5.pdf
Reference40 articles.
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4. Kennemur, J. G.; Hillmyer, M. A.; Bates, F. S. Synthesis, thermodynamics, and dynamics of poly (4-tert-butylstyrene-b-methyl methacrylate). Macromolecules 2012, 45, 7228–7236.
5. Kennemur, J. G.; Yao, L.; Bates, F. S.; Hillmyer, M. A. Sub-5 nm domains in ordered poly(cyclohexylethylene)-block-poly(methyl methacrylate) block polymers for lithography. Macromolecules 2014, 47, 1411–1418.
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