Optical characterization of ZnO thin films deposited by RF magnetron sputtering method

Author:

Tang Ning,Wang JinLiang,Xu HengXing,Peng HongYong,Fan Chao

Publisher

Springer Science and Business Media LLC

Reference10 articles.

1. Liu Y H, Sun W D. Preparation of ZnO thin films by RF magnetron sputtering and their properties (in Chinese). J Jinan Univer (Nat Sci & Med Edit), 2004, 25(3): 289–292

2. Zhang J, Xie Y Z, Xie E Q, et al. Photocatalysis properties of ZnO films grown by two-step oxidation (in Chinese). Chin J Vac Sci Tech, 2008, 28(4): 355–359

3. Yang L R, Jin Z G, Bu S J, et al. Preparation and optical properties of ZnO thin films (in Chinese). Ord Mat Sci Eng, 2004, 27(1): 34–38

4. Im S, Jin B J, Yi S. Ultraviolet emission and microstructural evolution in pulsed-laser-deposited ZnO films. J Appl Phys, 2000, 87(45): 4558–4561

5. Zhou B, Wang J L, Pan Y D, et al. Fabrication and physical properties of high-quality Zinc Oxide thin films. In: Proceedings of Sixth International Conference on Thin Film Physics and Applications. Shanghai: SPIE, 2008. 69840S-4

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