Helium Ion Lithography
Author:
Publisher
Springer Vienna
Link
http://link.springer.com/content/pdf/10.1007/978-3-7091-0424-8_4
Reference53 articles.
1. Morgan J, Notte J, Hill R, Ward B. Microscopy Today. 2006;14:24–31.
2. Hill R, Faridur Rahman FHM, Nucl Instr Meth A. 2010; in press. doi: 10.1016/j.nima.2010.12.123 .
3. Scipioni L, Ferranti DC, Smentkowski VS, Potyrailo RA. J Vac Sci Technol B. 2010;28:C6P18–23.
4. Sanford CA, Stern L, Barriss L, Farkas L, DiManna M, Mello R, Maas DJ, Alkemade PFA. J Vac Sci Technol B. 2009;27:2660–7.
5. Winston D, Cord BM, Ming B, Bell DC, DiNatale WF, Stern LA, Vladar AE, Postek MT, Mondol MK, Yang JKW, Berggren KK. J Vac Sci Technol B. 2009;27:2702–6.
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