Deposition of surface layers by the low-pressure chemical vapour deposition process conducted in a TiCl4+H2 atmosphere: contribution of the nitrogen contained in the Armco iron substrate-Reference-Cited by-同舟云学术

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Deposition of surface layers by the low-pressure chemical vapour deposition process conducted in a TiCl4+H2 atmosphere: contribution of the nitrogen contained in the Armco iron substrate

Published:1993 Issue:16 Volume:12 Page:1302-1305
ISSN:0261-8028
Container-title:Journal of Materials Science Letters
language:en
Short-container-title:J Mater Sci Lett

Author:

Michalski J.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00506345.pdf

Reference6 articles.

1. J. MICHALSKI and T. WIERZCHO?, J. Mater. Sci. Lett. 8 (1989) 779.

2. J. MICHALSKI, T. wIERZCHO?, M. SZAWLOWSKI and T. KARPINSKI, in Proceedings of the 4th International Conference on Carbides Nitrides and Borides, Pozna?-Kolobrzeg, 29 September?3 October 1987 (Pozna? University of Technology, 1987), p.246.

3. A. LUTZE-BIRK, L. WALI?, W. BIELSKI and J. TACIKOWSKI, Metaloznawstwo Obrobka Cieplna 68 (1984) 2.

4. J. MICHALSKI and T. WIERZCHO?, J. Mater. Sci. Lett. 9 (1990) 480.

5. J. BARIN and O. KNACKE, ?Thermochemical properties of inorganic substrates? (Springer-Verlag, Berlin, 1973).

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