Formation of titanium nitride layers from a gaseous phase with the participation of a chemical reaction-Reference-Cited by-同舟云学术

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Formation of titanium nitride layers from a gaseous phase with the participation of a chemical reaction

Published:1989-07 Issue:7 Volume:8 Page:779-780
ISSN:0261-8028
Container-title:Journal of Materials Science Letters
language:en
Short-container-title:J Mater Sci Lett

Author:

Michalski J.,Wierzchoń T.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF01730135.pdf

Reference4 articles.

1. T. TAKAHASHI,J. Electrochem. Soc. 12 (1976) 1230.

2. J. E. SANDFORD,Metallwork. Product. 32 (1965) 44.

3. V. G. PERMYAKOVet al., Metallofizika 4 (1975) 91.

4. J. MICHALSKI, T. WIERZCHOŃ and T. KARPIŃSKI, Proceedings of China Heat Treat '87 (1987) p. 109.

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Deposition of surface layers by the LPCVD process conducted in a TiCl4-H2-N2 atmosphere: contribution of the carbon contained in the steel substrate and of total pressure of the gaseous atmosphere;Journal of Materials Science Letters;1996

2. Laser Chemical Vapour Deposition of Titanium-Based Hard Coatings;Laser Processing: Surface Treatment and Film Deposition;1996

3. Modeling of Laser Chemical Vapor Deposition of Thin Films;Laser Processing: Surface Treatment and Film Deposition;1996

4. Pyrolytic LCVD Modeling;Theory and Application of Laser Chemical Vapor Deposition;1995

5. Structure and morphology of titanium nitride films deposited by laser-induced chemical vapour deposition;Journal of Materials Science;1994

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