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Optical constants of thin CoSi2 films on silicon

  • Published:1990-02 Issue:2 Volume:50 Page:177-181
  • ISSN:0721-7250
  • Container-title:Applied Physics A Solids and Surfaces
  • language:en
  • Short-container-title:Appl. Phys. A

Author:

W�lfel M.,Schulz M.,Ionally J.,Grunthaner P. J.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry,Physics and Astronomy (miscellaneous),General Engineering,General Materials Science

Cited by 23 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic Layer Deposition and Atomic Layer Etching—An Overview of Selective Processes;TMS 2021 150th Annual Meeting & Exhibition Supplemental Proceedings;2021

2. Atomic Layer Deposition of Cobalt Silicide Thin Films Studied by in Situ Infrared Spectroscopy;Chemistry of Materials;2015-07-13

3. Optical properties of Co silicides: Experiment and density functional theory;Journal of Applied Physics;2007-11-15

4. Rapid Thermal Processing;Handbook of Semiconductor Manufacturing Technology, Second Edition;2007-07-09

5. Fabrication of CoSi2-Buried-Metal-Layer Si Substrates for Infrared Reflection Absorption Spectroscopy by Wafer-Bonding;Japanese Journal of Applied Physics;2003-06-30
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