Design of cooling system for large-area and high-rate deposition of hydrogenated microcrystalline silicon
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Mechanical Engineering
Link
http://link.springer.com/content/pdf/10.1007/s12541-012-0150-z.pdf
Reference6 articles.
1. Hamakawa, Y., “Thin-film solar cells: Next generation photovoltaic sans its applications,” Springer, 2004.
2. Keppner, H., Meier, J., Torres, P., Fischer, D., and Shah, A., “Microcrystalline silicon and micromorph tandem solar cells,” Appl. Phys. A, Vol. 69, No. 2, pp. 169–177, 1999.
3. Lee, J., Hwang, J.-H., Lee, S. W., Park, S., Shin, S., and Chung, H., “Application of nano-pulsed Nd: YAG laser to crystallization of amorphous Si thin films for next generation flat-panel display,” Int. J. Precis. Eng. Manuf., Vol. 13, No. 4, pp. 587–591, 2012.
4. Van den Donker, M. N., Schmitz, R., Appenzeller, W., and Rech, B., “The role of plasma induced substrate heating during high rate deposition of microcrystalline silicon solar cells,” Thin Solid Films, Vol. 511–512, pp. 562–566, 2006.
5. Niikura, C., Kondo, M., and Matsuda, A., “Preparation of microcrystalline silicon films at ultra high-rate of 10 nm/s using high-density plasma,” Journal of Non-Crystalline Solids, Vol. 338–400, pp. 42–46, 2004.
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