Present and Future Applications of Amorphous Silicon Carbide-Reference-Cited by-同舟云学术

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Present and Future Applications of Amorphous Silicon Carbide

Published:1989 Issue: Volume: Page:58-65
ISSN:0930-8989
Container-title:Amorphous and Crystalline Silicon Carbide and Related Materials
language:
Short-container-title:

Author:

Furukawa S.

Publisher

Springer Berlin Heidelberg

Link

http://link.springer.com/content/pdf/10.1007/978-3-642-93406-3_8.pdf

Reference7 articles.

1. K. Sasaki, M. M. Rahman and S. Furukawa: 1984 Fall Meeting of the Japan Society of Applied Physics, 14p-A-4, p.409 (1984).

2. M. Ghannam, J. Nijs, R. Mertens and R. Dekeersmaecker: 1984 IEDM Tech. Dig., pp.746–748 (1984).

3. K. Sasaki, M. M. Rahman and S. Furukawa: Technical Report of Inst, of Electronics and Communication Engineers of Japan, ED85–8, pp. 15–20 (1985).

4. M. M. Rahman and S. Furukawa: 1st Int. PVSEC, Tech. Dig., pp.171–174 (1984).

5. K. Sasaki, M. M. Rahman: IEEE Elec. Dev. Lett., EDL-6[6], pp.311–312 (1985).

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1. Synthesis of Silicon Carbide Thin Films with Polycarbosilane (PCS);Journal of the American Ceramic Society;2005-01-20

2. Bonding and Thermal Reactivity in Thin a-SiC:H Films Grown by Methylsilane CVD;The Journal of Physical Chemistry B;1997-11-01

3. Temperature-Dependent Studies of a-SiC:H Growth by Remote Plasma CVD Using Methylsilanes;MRS Proceedings;1997

4. HBTs Using a-SiC and µc-Si;Springer Proceedings in Physics;1992

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