Design and Analysis of a Spatial Remote Center of Compliance Mechanism
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Publisher
Springer Berlin Heidelberg
Link
http://link.springer.com/content/pdf/10.1007/978-3-642-40849-6_38
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3. Lan, H.B., Ding, Y.C., Lu, H.Z.L., Development, B.H.: of a step micro-imprint lithography tool. J. Micromech. Microeng. 17(10), 2039–2048 (2007)
4. Simeone, F.C., Albonetti, C., Cavallini, M.: Progress in micro- and nanopatterning via electrochemical lithography. J. Phys. Chem. C 113(44), 18987–18994 (2009)
5. Namatsu, H., Oda, M., Yokoo, A., Fukuda, M., Irisa, K., Tsurumi, S., Komatsu, K.: Chemical nanoimprint lithography for step-and-repeat si patterning. J. Vac. Sci. Technol. B 25(6), 2321–2324 (2007)
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