Author:
Choi B.J.,Sreenivasan S.V.,Johnson S.,Colburn M.,Wilson C.G.
Reference12 articles.
1. Colburn M, et al. Step and Flash Imprint Lithography: A Novel Approach to Imprint Lithography, SPIE’s 24th Annual International Symposium on Microlithography, Santa Clara, CA, 1999.
2. Ruchhoeft P, et al. Patterning Curved Surfaces: Template Generation by Ion Beam Proximity Lithography and Relief Transfer by Step and Flash Imprint Lithography, J. Vac. Sci. Technol. Nov. 1999.
3. Stumbo DP, et al. J Vac Sci Technol 1991;B9:3597.
4. Chou SY, et al. Nanoimprint Lithography, J Vac Sci Technol B 1996;14(6):4129–33.
5. Haisma J, et al. Template-assisted Nanolithography: A Process for Reliable Pattern Replication. J Vac Sci Technol B 1996;14(6):4124–29.
Cited by
87 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献