AFM Characterization of Semiconductor Line Edge Roughness
Author:
Publisher
Springer Berlin Heidelberg
Link
http://link.springer.com/content/pdf/10.1007/978-3-642-35792-3_9
Reference54 articles.
1. Martin Y, Wickramasinghe HK (1995) J Vac Sci Technol B 13:2335
2. Diaz CH, Tao H-J, Ku Y-C, Yen A, Young K (2001) IEEE Electron Dev Lett 22:287
3. Oldiges P, Lin Q, Petrillo K, Sanchez M, Ieong M, Hargrove M (2000) IEEE Electron Dev Lett 21: 131
4. Patterson K, Sturtevant JL, Alvis J, Benavides N, Bonser D, Cave N, Nelson-Thomas C, Taylor B, Turnquest K (2001) Experimental determination of the impact ofpolysilicon LER on sub-l00-nm transistor performance. In: Sullivan NT (ed) Proc SPIE metrology, inspection, and process control for microlithography XV v4344. SPIE Press, Bellingham WA, p 809
5. Xiong S, Bokor J, Xiang Q, Fisher P, Dudley I, Rao P (2002) Study of gate line edge roughness effects in 50 nm bulk MOSFET devices. In: Herr DJC (ed) Proc SPIE metrology, inspection, and process control for micro lithography XVI v4689. SPIE Press, Bellingham WA, p 733
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Polymer LEDs with improved efficacy via periodic nanostructure-based aluminum;Optics Letters;2019-08-26
2. Line edge roughness metrology using atomic force microscopes;Measurement Science and Technology;2005-09-23
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3